Disain Dan Fabrikasi Mesin Sputtering Skala Laboratorium untuk Penumbuhan Film Tipis

Abstract

Plasma sputtering is well known method for preparation of thin films on various substrates. This technique involves expelling material from a target onto substrate in a vacuum chamber. Generally, the technique is equipped with argon supply system for ionized gas bombardments of the target. This work shows designing and fabricating process of a simple sputtering machine without gas supply system and its preliminary thin film preparation test. A CAD software was applied to design its main apparatus namely a vacuum system and an electrical system. Afterward, those apparatus were fabricated and assembled. Preliminary test was conducted using a cooper plate as a target and plate glasses as substrates for 90 s and 130 s processing time. The vacuum pressure, voltage and the electric current were set up at 10^-2 torr, 150 volt and 1 A, respectively. The thin film on the glass was visually examined and  its resistivity was measured using ohm meter. The results show that a cooper thin film has been coated on the glass with the resistivity of 12.6 and 9 Ω. At this stage , it is confirmed that the plasma sputtering machine being fabricated has successfully worked.