Perubahan Profil Wajah Sesudah Perawatan Ortodontik Cekat
DOI:
https://doi.org/10.18196/di.7192Keywords:
sefalometri radiograf lateral, teknik begg, sudut bidang oklusal, indek tinggi wajahAbstract
Pertumbuhan wajah perlu mendapat perhatian karena wajah merupakan salah satu bagian tubuh yang sangat berhubungan dengan nilai-nilai estetika dan penampilan. Penampilan wajah yang kurang menarik karena susunan gigi geligi yang tidak rapi atau posisi dan hubungan rahang yang kurang serasi dapat menimbulkan masalah psikososial. Tujuan: Mengetahui hubungan perubahan sudut bidang oklusal dan perubahan indek tinggi wajah pada kasus maloklusi Klas II divisi 1 sebelum dan sesudah perawatan ortodontik cekat teknik Begg. Metode penelitian: Observasional klinik pre and post control group design menggunakan data sekunder berupa 17 pasang sefalogram lateral sebelum dan sesudah perawatan, dibagi dalam dua kelompok yaitu kelompok I overjet 2 – 4 mm dan kelompok II overjet 4,1 – 6 mm usia antara 18 – 35 tahun kemudian dilakukan pengukuran linier dan anguler dengan penapakan sefalogram untuk mengetahui perubahan sudut bidang oklusal dan perubahan indek tinggi wajah dengan acuan garis Ar-Go, Me- PP. Hasil: Hasil penelitian menunjukkan adanya perubahan sudut bidang oklusal sebelum dan sesudah perawatan sebesar 2– 5 dan perubahan indek tinggi wajah sebelum dan sesudah perawatan sebesar 0,018 – 0,084 mm. Hasil uji korelasi Spearman perubahan sudut bidang oklusal dan perubahan indek tinggi wajah sebelum dan sesudah perawatan untuk kelompok I dan kelompok II menunjukkan hubungan negatif bermakna (P<0,05). Hasil dari Mann-Whitney test antara kelompok I dan II menunjukkan adanya perbedaan yang bermakna (P<0,05). Kesimpulan: Kesimpulan dari penelitian terdapat hubungan negatif antara perubahan sudut bidang oklusal dengan perubahan indek tinggi wajah pada perawatan ortodontik maloklusi kelas II divisi 1 dengan teknik Begg.Downloads
Published
2019-05-29
Issue
Section
Articles
License
License
Insisiva Dental Journal : Majalah Kedokteran Gigi Insisiva (IDJ) is licensed under an Attribution-ShareAlike 4.0 International (CC BY-SA 4.0) license. You are free to:
- Share — copy and redistribute the material in any medium or format
- Adapt — remix, transform, and build upon the material for any purpose, even commercially. This license is acceptable for Free Cultural Works.
The licensor cannot revoke these freedoms as long as you follow the license terms.
- Attribution — You must give appropriate credit, provide a link to the license, and indicate if changes were made. You may do so in any reasonable manner, but not in any way that suggests the licensor endorses you or your use.
- ShareAlike — If you remix, transform, or build upon the material, you must distribute your contributions under the same license as the original.
- No additional restrictions — You may not apply legal terms or technological measures that legally restrict others from doing anything the license permits.
Copyright
Authors who publish with this journal agree to the following terms:
- Authors retain copyright and grant the journal right of first publication with the work simultaneously licensed under an Attribution-ShareAlike 4.0 International (CC BY-SA 4.0) that allows others to share the work with an acknowledgment of the work's authorship and initial publication in this journal.
- Authors are able to enter into separate, additional contractual arrangements for the non-exclusive distribution of the journal's published version of the work (e.g., post it to an institutional repository or publish it in a book), with an acknowledgment of its initial publication in this journal.
- Authors are permitted and encouraged to post their work online (e.g., in institutional repositories or on their website) prior to and during the submission process, as it can lead to productive exchanges, as well as earlier and greater citation of published work (See The Effect of Open Access).